Influence of the microstructure on the electrochemical properties of Al-Cr-N coatings deposited by Co-Sputtering method from a Cr-Al binary target

Article

Abstract: In the present paper, aluminum chromium nitride (Al-Cr-N) films were deposited onto AISI H13 steel s

Palabras claves:

Aluminum chromium nitride, Co-sputtering, electrochemical properties, thin films

Autores:

Barco J., Beltran F.E., Ipaz L., Quintero O., William Arnulfo Ch Aperador, Zambrano G.

Fuentes:

scopus