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Influence of the microstructure on the electrochemical properties of Al-Cr-N coatings deposited by Co-Sputtering method from a Cr-Al binary target
ArticleAbstract: In the present paper, aluminum chromium nitride (Al-Cr-N) films were deposited onto AISI H13 steel sPalabras claves:Aluminum chromium nitride, Co-sputtering, electrochemical properties, thin filmsAutores:Barco J., Beltran F.E., Ipaz L., Quintero O., William Arnulfo Ch Aperador, Zambrano G.Fuentes:scopusMechanical and electrochemical characterization of vanadium nitride (VN) thin films
ArticleAbstract: Vanadium nitride (V-N) thin films were grown using a reactive d.c. magnetron sputtering process, froPalabras claves:Electrochemical impedance spectroscopy, Hard films, magnetron sputtering, Mechanical properties, Vanadium nitrideAutores:Caicedo J.C., Camps E., Escobar-Alarcon L., William Arnulfo Ch Aperador, Zambrano G.Fuentes:scopus