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scopus(2)
Process- and optoelectronic-control of NiO<inf>x</inf> thin films deposited by reactive high power impulse magnetron sputtering
ArticleAbstract: In this contribution, based on the analyses of the discharge behavior as well as final properties ofPalabras claves:Autores:Corraze B., Delfour-Peyrethon B., Ferrec A., Goullet A., Hamon J., Javier García Molleja, Jouan P.Y., Keraudy J., Payen C., Richard-Plouet M.Fuentes:scopusStructural, morphological and electrical properties of nickel oxide thin films deposited by reactive sputtering
ArticleAbstract: This paper is devoted to the study of the influence of oxygen content in the nickel oxide films on tPalabras claves:C-AFM, DC reactive sputtering, Electrical characterization, Nickel oxide, Nickel vacancyAutores:Corraze B., Ferrec A., Goullet A., Javier García Molleja, Jouan P.Y., Keraudy J., Richard-Plouet M.Fuentes:scopus