Palabras claves: electron mobility, hydrogenated fluorine-doped indium oxide (IFO:H), passivating contacts, Silicon heterojunction (SHJ), transparent conductive oxide (TCO)
Autores: Gulino A., Han C., Isabella O., Mazzarella L., Montes A., Paul Procel, Spitaleri L., Tijssen M., Yang G., Zeman M., Zhang X., Zhao Y.