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AIN thin films deposited by DC reactive magnetron sputtering: Effect of oxygen on film growth
ArticleAbstract: Aluminum nitride is a ceramic compound with many technological applications in many fields, for examPalabras claves:Autores:Abdallah B., Burgi J., Djouadi M.A., Ferrón J., Feugeas J.N., Gautron E., Gõmez B.J., Javier García Molleja, Jouan P.Y.Fuentes:scopusDepth profiling and morphological characterization of AlN thin films deposited on Si substrates using a reactive sputter magnetron
ArticleAbstract: It is well-known that the characteristics of aluminum nitride thin films mainly depend on their morpPalabras claves:Autores:Bemporad E., Brusa R.S., Burgi J., Feugeas J.N., Javier García Molleja, MacChi C., Mariazzi S., Piccoli M., Somoza A.Fuentes:scopusMechanical properties by indentation of aluminium nitride nanometric thin film
ArticleAbstract: The mechanical properties of thin film are usually determined by nanoindentation in order to circumvPalabras claves:Aluminum nitride, Analytical modeling, Nanoindentation, Thin filmAutores:Burgi J., Chicot D., Decoopman X., Feugeas J.N., Iost A., Javier García Molleja, Roudet F.Fuentes:scopusUnveiling the structure, chemistry, and formation mechanism of an in-situ phosphazene flame retardant-derived interphase layer in LiFePO<inf>4</inf> cathode
ArticleAbstract: The safety risks posed by the liquid electrolytes of lithium-ion batteries have drawn large-scale coPalabras claves:Cone calorimetry, Electrode–electrolyte interphase, Fire retardants, Fire safety, Flame retarded electrolytesAutores:De la Vega J., Javier García Molleja, Sai Avvaru V., Wang D.Y., Yusuf A., Zhang M.Fuentes:scopusReactive sputter magnetron reactor for preparation of thin films and simultaneous in situ structural study by X-ray diffraction
ArticleAbstract: The purpose of the designed reactor is (i) to obtain polycrystalline and/or amorphous thin films byPalabras claves:Autores:Burgi J., Craievich A.F., Feugeas J.N., Javier García Molleja, Kellermann G., Neuenschwander R.Fuentes:scopusProcess- and optoelectronic-control of NiO<inf>x</inf> thin films deposited by reactive high power impulse magnetron sputtering
ArticleAbstract: In this contribution, based on the analyses of the discharge behavior as well as final properties ofPalabras claves:Autores:Corraze B., Delfour-Peyrethon B., Ferrec A., Goullet A., Hamon J., Javier García Molleja, Jouan P.Y., Keraudy J., Payen C., Richard-Plouet M.Fuentes:scopusStability of expanded austenite, generated by ion carburizing and ion nitriding of AISI 316L SS, under high temperature and high energy pulsed ion beam irradiation
ArticleAbstract: Expanded austenite can be generated on austenitic stainless steels either by ion carburizing or ionPalabras claves:Crystalline stability, expanded austenite, ion carburizing, Plasma focusAutores:Bemporad E., Burgi J., Feugeas J.N., Javier García Molleja, Milanese M., Moroso R., Niedbalski J., Nosei L., Piccoli M.Fuentes:scopusSynchrotron radiation applied to real-Time studies of the kinetics of growth of aluminum nitride thin multilayers
ArticleAbstract: This article reports the design, construction, and first use of an experimental device consisting ofPalabras claves:Autores:Bemporad E., Burgi J., Craievich A.F., De Felicis D., Djouadi M.A., Feugeas J.N., Javier García Molleja, Jouan P.Y., Kellermann G., Neuenschwander R., Piccoli M.Fuentes:scopus