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Structural, morphological and electrical properties of nickel oxide thin films deposited by reactive sputtering
ArticleAbstract: This paper is devoted to the study of the influence of oxygen content in the nickel oxide films on tPalabras claves:C-AFM, DC reactive sputtering, Electrical characterization, Nickel oxide, Nickel vacancyAutores:Corraze B., Ferrec A., Goullet A., Javier García Molleja, Jouan P.Y., Keraudy J., Richard-Plouet M.Fuentes:scopusSynchrotron radiation applied to real-Time studies of the kinetics of growth of aluminum nitride thin multilayers
ArticleAbstract: This article reports the design, construction, and first use of an experimental device consisting ofPalabras claves:Autores:Bemporad E., Burgi J., Craievich A.F., De Felicis D., Djouadi M.A., Feugeas J.N., Javier García Molleja, Jouan P.Y., Kellermann G., Neuenschwander R., Piccoli M.Fuentes:scopus