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AIN thin films deposited by DC reactive magnetron sputtering: Effect of oxygen on film growth
ArticleAbstract: Aluminum nitride is a ceramic compound with many technological applications in many fields, for examPalabras claves:Autores:Abdallah B., Burgi J., Djouadi M.A., Ferrón J., Feugeas J.N., Gautron E., Gõmez B.J., Javier García Molleja, Jouan P.Y.Fuentes:scopusMechanical properties by indentation of aluminium nitride nanometric thin film
ArticleAbstract: The mechanical properties of thin film are usually determined by nanoindentation in order to circumvPalabras claves:Aluminum nitride, Analytical modeling, Nanoindentation, Thin filmAutores:Burgi J., Chicot D., Decoopman X., Feugeas J.N., Iost A., Javier García Molleja, Roudet F.Fuentes:scopus