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Article(9)
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EPJ Applied Physics(3)
Journal of Physical Chemistry B(1)
Materiaux et Techniques(1)
Review of Scientific Instruments(1)
Surface and Coatings Technology(1)
Behavior of nitrided and carburized AISI 904-L stainless steels under severe light ion beam irradiation with plasma focus
ArticleAbstract: Superaustenitic stainless steels have become of growing interest in industrial and technological fiePalabras claves:Crystalline stability, expanded austenite, ion carburizing, ion nitriding, Plasma focus, superaustenitic stainless steelsAutores:Bemporad E., Burgi J., Feugeas J.N., Gõmez B.J., Javier García Molleja, Milanese M., Moroso R., Niedbalski J., Piccoli M.Fuentes:scopus(1011) preferential orientation of polycrystalline AlN grown on SiO<inf>2</inf>/Si wafers by reactive sputter magnetron technique
ArticleAbstract: Aluminum nitride (AlN) is a ceramic compound that could be used as a processing material for semiconPalabras claves:Autores:Bemporad E., Bolmaro R., Burgi J., Craievich A.F., Feugeas J.N., Javier García Molleja, Piccoli M.Fuentes:scopusAIN thin films deposited by DC reactive magnetron sputtering: Effect of oxygen on film growth
ArticleAbstract: Aluminum nitride is a ceramic compound with many technological applications in many fields, for examPalabras claves:Autores:Abdallah B., Burgi J., Djouadi M.A., Ferrón J., Feugeas J.N., Gautron E., Gõmez B.J., Javier García Molleja, Jouan P.Y.Fuentes:scopusDepth profiling and morphological characterization of AlN thin films deposited on Si substrates using a reactive sputter magnetron
ArticleAbstract: It is well-known that the characteristics of aluminum nitride thin films mainly depend on their morpPalabras claves:Autores:Bemporad E., Brusa R.S., Burgi J., Feugeas J.N., Javier García Molleja, MacChi C., Mariazzi S., Piccoli M., Somoza A.Fuentes:scopusMechanical properties by indentation of aluminium nitride nanometric thin film
ArticleAbstract: The mechanical properties of thin film are usually determined by nanoindentation in order to circumvPalabras claves:Aluminum nitride, Analytical modeling, Nanoindentation, Thin filmAutores:Burgi J., Chicot D., Decoopman X., Feugeas J.N., Iost A., Javier García Molleja, Roudet F.Fuentes:scopusModeling of very thin aluminum nitride film mechanical properties from nanoindentation measurements
ArticleAbstract: The mechanical property determination of thin films by nanoindentation can be affected by the substrPalabras claves:Aluminum nitride, Elastic modulus, hardness, Modeling, Nanoindentation, thin filmsAutores:Burgi J., Chicot D., Decoopman X., Feugeas J.N., Iost A., Javier García Molleja, Nosei L., Roudet F.Fuentes:scopusReactive sputter magnetron reactor for preparation of thin films and simultaneous in situ structural study by X-ray diffraction
ArticleAbstract: The purpose of the designed reactor is (i) to obtain polycrystalline and/or amorphous thin films byPalabras claves:Autores:Burgi J., Craievich A.F., Feugeas J.N., Javier García Molleja, Kellermann G., Neuenschwander R.Fuentes:scopusStability of expanded austenite, generated by ion carburizing and ion nitriding of AISI 316L SS, under high temperature and high energy pulsed ion beam irradiation
ArticleAbstract: Expanded austenite can be generated on austenitic stainless steels either by ion carburizing or ionPalabras claves:Crystalline stability, expanded austenite, ion carburizing, Plasma focusAutores:Bemporad E., Burgi J., Feugeas J.N., Javier García Molleja, Milanese M., Moroso R., Niedbalski J., Nosei L., Piccoli M.Fuentes:scopusSynchrotron radiation applied to real-Time studies of the kinetics of growth of aluminum nitride thin multilayers
ArticleAbstract: This article reports the design, construction, and first use of an experimental device consisting ofPalabras claves:Autores:Bemporad E., Burgi J., Craievich A.F., De Felicis D., Djouadi M.A., Feugeas J.N., Javier García Molleja, Jouan P.Y., Kellermann G., Neuenschwander R., Piccoli M.Fuentes:scopus