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(1011) preferential orientation of polycrystalline AlN grown on SiO<inf>2</inf>/Si wafers by reactive sputter magnetron technique
ArticleAbstract: Aluminum nitride (AlN) is a ceramic compound that could be used as a processing material for semiconPalabras claves:Autores:Bemporad E., Bolmaro R., Burgi J., Craievich A.F., Feugeas J.N., Javier García Molleja, Piccoli M.Fuentes:scopusAIN thin films deposited by DC reactive magnetron sputtering: Effect of oxygen on film growth
ArticleAbstract: Aluminum nitride is a ceramic compound with many technological applications in many fields, for examPalabras claves:Autores:Abdallah B., Burgi J., Djouadi M.A., Ferrón J., Feugeas J.N., Gautron E., Gõmez B.J., Javier García Molleja, Jouan P.Y.Fuentes:scopusDepth profiling and morphological characterization of AlN thin films deposited on Si substrates using a reactive sputter magnetron
ArticleAbstract: It is well-known that the characteristics of aluminum nitride thin films mainly depend on their morpPalabras claves:Autores:Bemporad E., Brusa R.S., Burgi J., Feugeas J.N., Javier García Molleja, MacChi C., Mariazzi S., Piccoli M., Somoza A.Fuentes:scopus