AIN thin films deposited by DC reactive magnetron sputtering: Effect of oxygen on film growth

Article

Abstract: Aluminum nitride is a ceramic compound with many technological applications in many fields, for exam

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Autores:

Abdallah B., Burgi J., Djouadi M.A., Ferrón J., Feugeas J.N., Gautron E., Gõmez B.J., Javier García Molleja, Jouan P.Y.

Fuentes:

scopus