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(1011) preferential orientation of polycrystalline AlN grown on SiO<inf>2</inf>/Si wafers by reactive sputter magnetron technique
ArticleAbstract: Aluminum nitride (AlN) is a ceramic compound that could be used as a processing material for semiconPalabras claves:Autores:Bemporad E., Bolmaro R., Burgi J., Craievich A.F., Feugeas J.N., Javier García Molleja, Piccoli M.Fuentes:scopusDepth profiling and morphological characterization of AlN thin films deposited on Si substrates using a reactive sputter magnetron
ArticleAbstract: It is well-known that the characteristics of aluminum nitride thin films mainly depend on their morpPalabras claves:Autores:Bemporad E., Brusa R.S., Burgi J., Feugeas J.N., Javier García Molleja, MacChi C., Mariazzi S., Piccoli M., Somoza A.Fuentes:scopus