Feugeas J.N.
72
Coauthors
10
Documentos
Volumen de publicaciones por año
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| Año de publicación | Num. Publicaciones |
|---|---|
| 2010 | 1 |
| 2013 | 3 |
| 2014 | 1 |
| 2015 | 3 |
| 2016 | 1 |
| 2019 | 1 |
Publicaciones por áreas de conocimiento
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| Área de conocimiento | Num. Publicaciones |
|---|---|
| Ciencia de materiales | 20 |
| Película delgada | 3 |
| Nanostructura | 1 |
Publicaciones por áreas temáticas
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| Área temática | Num. Publicaciones |
|---|---|
| Ingeniería y operaciones afines | 7 |
| Física aplicada | 6 |
| Metalurgia | 2 |
| Metalurgia y productos metálicos primarios | 2 |
| Física | 2 |
| Química inorgánica | 1 |
| Otras ramas de la ingeniería | 1 |
| Cristalografía | 1 |
| Magnetismo | 1 |
Principales fuentes de datos
| Origen | Num. Publicaciones |
|---|---|
| Scopus | 10 |
| Google Scholar | 0 |
| RRAAE | 0 |
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Coautores destacados por número de publicaciones
| Coautor | Num. Publicaciones |
|---|---|
| Javier García Molleja | 10 |
| Burgi J. | 9 |
| Bemporad E. | 6 |
| Piccoli M. | 5 |
| Craievich A.F. | 3 |
| Nosei L. | 3 |
| Chicot D. | 3 |
| Gõmez B.J. | 2 |
| Ferrón J. | 2 |
| Jouan P.Y. | 2 |
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Top Keywords
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Publicaciones del autor
Reactive sputter magnetron reactor for preparation of thin films and simultaneous in situ structural study by X-ray diffraction
ArticleAbstract: The purpose of the designed reactor is (i) to obtain polycrystalline and/or amorphous thin films byPalabras claves:Autores:Burgi J., Craievich A.F., Feugeas J.N., Javier García Molleja, Kellermann G., Neuenschwander R.Fuentes:scopusCharacterization of expanded austenite developed on AISI 316L stainless steel by plasma carburization
ArticleAbstract: Expanded austenite generation through ion carburizing of AISI 316L using two different reactive gasPalabras claves:Carbon diffusion, expanded austenite, ion carburizing, Surface treatment, Tribology of solids, Wear protectionAutores:Bemporad E., Chicot D., Ferrón J., Feugeas J.N., Javier García Molleja, Lesage J., Nosei L.Fuentes:scopus(1011) preferential orientation of polycrystalline AlN grown on SiO<inf>2</inf>/Si wafers by reactive sputter magnetron technique
ArticleAbstract: Aluminum nitride (AlN) is a ceramic compound that could be used as a processing material for semiconPalabras claves:Autores:Bemporad E., Bolmaro R., Burgi J., Craievich A.F., Feugeas J.N., Javier García Molleja, Piccoli M.Fuentes:scopusMechanical properties by indentation of aluminium nitride nanometric thin film
ArticleAbstract: The mechanical properties of thin film are usually determined by nanoindentation in order to circumvPalabras claves:Aluminum nitride, Analytical modeling, Nanoindentation, Thin filmAutores:Burgi J., Chicot D., Decoopman X., Feugeas J.N., Iost A., Javier García Molleja, Roudet F.Fuentes:scopusModeling of very thin aluminum nitride film mechanical properties from nanoindentation measurements
ArticleAbstract: The mechanical property determination of thin films by nanoindentation can be affected by the substrPalabras claves:Aluminum nitride, Elastic modulus, hardness, Modeling, Nanoindentation, thin filmsAutores:Burgi J., Chicot D., Decoopman X., Feugeas J.N., Iost A., Javier García Molleja, Nosei L., Roudet F.Fuentes:scopus