Depth profiling and morphological characterization of AlN thin films deposited on Si substrates using a reactive sputter magnetron

Article

Abstract: It is well-known that the characteristics of aluminum nitride thin films mainly depend on their morp

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Autores:

Bemporad E., Brusa R.S., Burgi J., Feugeas J.N., Javier García Molleja, MacChi C., Mariazzi S., Piccoli M., Somoza A.

Fuentes:

scopus