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AIN thin films deposited by DC reactive magnetron sputtering: Effect of oxygen on film growth
ArticleAbstract: Aluminum nitride is a ceramic compound with many technological applications in many fields, for examPalabras claves:Autores:Abdallah B., Burgi J., Djouadi M.A., Ferrón J., Feugeas J.N., Gautron E., Gõmez B.J., Javier García Molleja, Jouan P.Y.Fuentes:scopusStructural, morphological and electrical properties of nickel oxide thin films deposited by reactive sputtering
ArticleAbstract: This paper is devoted to the study of the influence of oxygen content in the nickel oxide films on tPalabras claves:C-AFM, DC reactive sputtering, Electrical characterization, Nickel oxide, Nickel vacancyAutores:Corraze B., Ferrec A., Goullet A., Javier García Molleja, Jouan P.Y., Keraudy J., Richard-Plouet M.Fuentes:scopus