Process- and optoelectronic-control of NiO<inf>x</inf> thin films deposited by reactive high power impulse magnetron sputtering

Article

Abstract: In this contribution, based on the analyses of the discharge behavior as well as final properties of

Palabras claves:

Autores:

Corraze B., Delfour-Peyrethon B., Ferrec A., Goullet A., Hamon J., Javier García Molleja, Jouan P.Y., Keraudy J., Payen C., Richard-Plouet M.

Fuentes:

scopus