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Applied Surface Science(1)
EPJ Applied Physics(1)
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Journal of Physical Chemistry B(1)
AIN thin films deposited by DC reactive magnetron sputtering: Effect of oxygen on film growth
ArticleAbstract: Aluminum nitride is a ceramic compound with many technological applications in many fields, for examPalabras claves:Autores:Abdallah B., Burgi J., Djouadi M.A., Ferrón J., Feugeas J.N., Gautron E., Gõmez B.J., Javier García Molleja, Jouan P.Y.Fuentes:scopusProcess- and optoelectronic-control of NiO<inf>x</inf> thin films deposited by reactive high power impulse magnetron sputtering
ArticleAbstract: In this contribution, based on the analyses of the discharge behavior as well as final properties ofPalabras claves:Autores:Corraze B., Delfour-Peyrethon B., Ferrec A., Goullet A., Hamon J., Javier García Molleja, Jouan P.Y., Keraudy J., Payen C., Richard-Plouet M.Fuentes:scopusStructural, morphological and electrical properties of nickel oxide thin films deposited by reactive sputtering
ArticleAbstract: This paper is devoted to the study of the influence of oxygen content in the nickel oxide films on tPalabras claves:C-AFM, DC reactive sputtering, Electrical characterization, Nickel oxide, Nickel vacancyAutores:Corraze B., Ferrec A., Goullet A., Javier García Molleja, Jouan P.Y., Keraudy J., Richard-Plouet M.Fuentes:scopusSynchrotron radiation applied to real-Time studies of the kinetics of growth of aluminum nitride thin multilayers
ArticleAbstract: This article reports the design, construction, and first use of an experimental device consisting ofPalabras claves:Autores:Bemporad E., Burgi J., Craievich A.F., De Felicis D., Djouadi M.A., Feugeas J.N., Javier García Molleja, Jouan P.Y., Kellermann G., Neuenschwander R., Piccoli M.Fuentes:scopus