Morphology and thermal stability of AlF <inf>3</inf> thin films grown on Cu(100)

Article

Abstract: The growth of ultrathin epitaxial layers of aluminum fluoride on Cu(100) has been studied by a combi

Palabras claves:

aluminum fluoride, Electron beam resist, Insulators, Radiolysis, spintronics

Autores:

De Miguel J., Ferrón J., Juan Carlos Moreno-López, Miranda R., Niño M., Passeggi M.C.G., Ruano G., Vidal R.A.

Fuentes:

scopus