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Evolution of physical properties in hafnium carbonitride thin films

Abstract:

Hafnium carbonitride coatings were deposited onto silicon substrates by reactive r.f. magnetron co-sputtering from hafnium and carbon targets in a reactive nitrogen atmosphere, varying applied negative bias voltages (0, −50, −100, and −150 V). The effect of the applied bias voltage on the crystalline structure, chemical composition, and mechanical properties was observed via X-ray diffraction, X-ray photoelectron spectroscopy, scanning electron microscopy, Fourier transform infrared spectroscopy, and nanoindentation techniques. The results show that the samples present constant stoichiometric ratio, Hf/(C+N), exhibiting improved mechanical properties by increasing negative bias voltage from 17 to 32 GPa for the hardness and from 200 to 280 GPa for elastic modulus. Therefore, the [Formula presented] coatings can be used as future hard coating materials.