In situ FTIR experimental results in the silylation of low-k films with hexamethyldisilazane dissolved in supercritical carbon dioxide


Abstract:

In situ Fourier Transform Infrared Spectroscopy measurements were performed using an innovative equipment to study the surface modification reaction between a functionalized porous MSQ-film and hexamethyldisilazane (HMDS) dissolved in CO<inf>2</inf> at supercritical conditions (scCO<inf>2</inf>). scCO<inf>2</inf> was used in the heterogeneous reaction due to enhancing properties, ideal for porous materials. Different infrared signatures, from the gas and solid phases, were observed and identified, implying gas-gas and solid-gas phase reactions. Among the different component signatures observed in the gas phase, carbonic acid was observed as a possible silylating gas phase nucleophilic component, while in the solid phase the predominant reaction mechanism proceeded by forming SiOSi bonds and Trimethylaminosilane (as gas phase product). © 2014 Published by Elsevier B.V.

Año de publicación:

2014

Keywords:

  • In situ FTIR
  • HMDS
  • Heterogeneous reaction
  • Low-k
  • Silylation

Fuente:

scopusscopus

Tipo de documento:

Article

Estado:

Acceso restringido

Áreas de conocimiento:

  • Ciencia de materiales
  • Material compuesto
  • Ciencia de materiales

Áreas temáticas de Dewey:

  • Física aplicada
  • Ingeniería y operaciones afines
  • Química analítica
Procesado con IAProcesado con IA

Objetivos de Desarrollo Sostenible:

  • ODS 9: Industria, innovación e infraestructura
  • ODS 12: Producción y consumo responsables
  • ODS 7: Energía asequible y no contaminante
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