In situ FTIR experimental results in the silylation of low-k films with hexamethyldisilazane dissolved in supercritical carbon dioxide
Abstract:
In situ Fourier Transform Infrared Spectroscopy measurements were performed using an innovative equipment to study the surface modification reaction between a functionalized porous MSQ-film and hexamethyldisilazane (HMDS) dissolved in CO<inf>2</inf> at supercritical conditions (scCO<inf>2</inf>). scCO<inf>2</inf> was used in the heterogeneous reaction due to enhancing properties, ideal for porous materials. Different infrared signatures, from the gas and solid phases, were observed and identified, implying gas-gas and solid-gas phase reactions. Among the different component signatures observed in the gas phase, carbonic acid was observed as a possible silylating gas phase nucleophilic component, while in the solid phase the predominant reaction mechanism proceeded by forming SiOSi bonds and Trimethylaminosilane (as gas phase product). © 2014 Published by Elsevier B.V.
Año de publicación:
2014
Keywords:
- In situ FTIR
- HMDS
- Heterogeneous reaction
- Low-k
- Silylation
Fuente:
scopusTipo de documento:
Article
Estado:
Acceso restringido
Áreas de conocimiento:
- Ciencia de materiales
- Material compuesto
- Ciencia de materiales
Áreas temáticas de Dewey:
- Física aplicada
- Ingeniería y operaciones afines
- Química analítica
Objetivos de Desarrollo Sostenible:
- ODS 9: Industria, innovación e infraestructura
- ODS 12: Producción y consumo responsables
- ODS 7: Energía asequible y no contaminante