Influence of the substrate bias voltage on the crystallographic structure and mechanical properties of Ti6Al4V coatings deposited by rf magnetron

Abstract:

Physical and mechanical properties of pure titanium are improved when the material is mixed with aluminum and vanadium at specific concentrations. Specifically, the alloy composed by 90% of titanium, 6% of aluminum and 4% of vanadium (Ti‐6Al‐4V) is highly resistant to fatigue and corrosion titanium and their alloys can be deposited by two techniques: Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD). However, some problems are generated when carbonated steel substrates are used under the CVD technique, mainly because those substrates lost its carbon as a result of the high substrate temperature used during the deposition process. Alternatively, PVD (magnetron sputtering, ion plating) is a low temperature substrate process and also has the advantage that substrate bias can promote structure refinement through resputtering effects. Substrate bias influence on the crystalline …

Año de publicación:

2005

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