Low temperature crystallization of sputtered carbon films

Abstract:

The crystallization of amorphous carbon films, under inert atmospheres, occurs at annealing temperatures above 800 °C. In this work we have found that when the annealing of carbon films is performed under atmospheric conditions, crystallization occurs at temperatures as low as 200 °C. The catalytic effect of oxygen in the crystallization process is understood in terms of the generation of a porous structure in the carbon film due to the vaporization of carbon oxides. © 1995 American Institute of Physics.

Año de publicación:

1995

Keywords:

Fuente:

scopus