Thin film deposition of Ta, TaN and Ta/TaN bi-layer on Ti and SS316-LVM substrates by RF sputtering


Abstract:

The formation and characterization of Ta, TaN and the bilayer Ta/TaN thin films deposited by RF sputtering on different substrates: Ti and SS316L, was studied. The films were characterized by XRD, GIXRD, HRSEM, AFM, XPS and nanoindentation. It was found that the nature of the substrate has a strong influence on the Ta phase formed. Formation of α-Ta phase was obtained on SS316LVM, but the β-Ta phase was formed on Ti and on TaN substrates. The substrate affects not only the phase formed but also the microstructure and roughness of the deposited thin films.

Año de publicación:

2017

Keywords:

  • characterization
  • RF sputtering
  • Ta
  • TaN and Ta/TaN thin films

Fuente:

scopusscopus
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Tipo de documento:

Article

Estado:

Acceso restringido

Áreas de conocimiento:

  • Ciencia de materiales
  • Ciencia de materiales

Áreas temáticas:

  • Metalurgia y productos metálicos primarios
  • Física aplicada