Thin film deposition of Ta, TaN and Ta/TaN bi-layer on Ti and SS316-LVM substrates by RF sputtering
Abstract:
The formation and characterization of Ta, TaN and the bilayer Ta/TaN thin films deposited by RF sputtering on different substrates: Ti and SS316L, was studied. The films were characterized by XRD, GIXRD, HRSEM, AFM, XPS and nanoindentation. It was found that the nature of the substrate has a strong influence on the Ta phase formed. Formation of α-Ta phase was obtained on SS316LVM, but the β-Ta phase was formed on Ti and on TaN substrates. The substrate affects not only the phase formed but also the microstructure and roughness of the deposited thin films.
Año de publicación:
2017
Keywords:
- characterization
- RF sputtering
- Ta
- TaN and Ta/TaN thin films
Fuente:
scopus
google
Tipo de documento:
Article
Estado:
Acceso restringido
Áreas de conocimiento:
- Ciencia de materiales
- Ciencia de materiales
Áreas temáticas:
- Metalurgia y productos metálicos primarios
- Física aplicada