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Capacitance Extraction of 34-nm Metallurgical Channel Length MOSFET for Parasitic Assessment Using the RFCV Technique

Abstract:

This paper presents the description and the results obtained with a new RFCV system written on python v2.7. which is used to acquire different parameters from MOSFET devices. RFCV is a technique that permits the measurement of capacitances from devices with an oxide thickness up into the nanometric range. Employing this technique, the developed system controls two tools in a synchronized way: A Vector Network Analyzer (VNA) and a Source Measure Unit (SMU) located in a Parameter Analyzer (PA). The obtained results are satisfactory and allow getting an adequate parameter extraction and the corresponding parasitic assessment of devices with channels as short as 34 nm.