Thin film deposition of Ta, TaN and Ta/TaN bi-layer on Ti and SS316-LVM substrates by RF sputtering

Article

Abstract: The formation and characterization of Ta, TaN and the bilayer Ta/TaN thin films deposited by RF sput

Palabras claves:

characterization, RF sputtering, Ta, TaN and Ta/TaN thin films

Autores:

Flaud V., Fraisse B., Fréty N., Jara A., Luis José Borrero González

Fuentes:

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