Palabras claves: characteristic impedance, dielectric buffer layer, HSO, lithium niobate, Silicon nitride, silicon oxide
Autores: A. G. Correa-Mena, Gabriela Correa-Mena, Gonzalez L.A., Ignacio Enrique Zaldívar-Huerta, Quintero-Rodriguez L.J., Valdes-Rayon J.