In-Situ FTIR Kinetic Study in the Silylation of Low-k Films with Hexamethyldisilazane Dissolved in Supercritical CO<inf>2</inf>

Article

Abstract: In-situ Fourier transform infrared spectroscopy measurements were obtained by using an innovative eq

Palabras claves:

HMDS, kinetics, Reaction engineering, Semiconductors, Silylation, Supercritical fluids

Autores:

Eduardo Vyhmeister, Estévez L.A., Muscat A.J., Reyes-Bozo L., Roman Nicolay Rodríguez-Maecker, Suleiman D., Valdes-Gonzalez H.

Fuentes:

scopus