Influence of Si-addition on wear and oxidation resistance of TiWSi<inf>x</inf>N thin films

Article

Abstract: TiWSixN films were deposited using a magnetron co-sputtering system on silicon (111), 316L stainless

Palabras claves:

Co-sputtering, Cyclic oxidation, Sublimation of WO 3, TiWSi N films x, Wear rate

Autores:

Coy L.E., Macías H.A., Olaya-Flórez J.J., William Arnulfo Ch Aperador, Yate L.

Fuentes:

scopus