X-ray studies of the growth of smooth Ag films on Ge(111)-c(2×8)

Abstract:

The growth and morphology of Ag films prepared by low temperature deposition onto Ge(111) were studied. In situ reflectivity measurements using synchrotron radiation were performed over the thickness range of 3-12 atomic layers. It was observed that the best films were obtained by starting from a fresh substrate surface, depositing at low temperatures and annealing at room temperatures. The results show that the films deposited at a substrate temperature of 110 K are not well ordered, but become well ordered upon annealing.

Año de publicación:

2004

Keywords:

Fuente:

scopus

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