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In situ FTIR experimental results in the silylation of low-k films with hexamethyldisilazane dissolved in supercritical carbon dioxide
ArticleAbstract: In situ Fourier Transform Infrared Spectroscopy measurements were performed using an innovative equiPalabras claves:Heterogeneous reaction, HMDS, In situ FTIR, Low-k, SilylationAutores:Eduardo Vyhmeister, Estévez L.A., Muscat A.J., Reyes-Bozo L., Salazar J.L., Suleiman D., Valdes-Gonzalez H.Fuentes:scopusIn-Situ FTIR Kinetic Study in the Silylation of Low-k Films with Hexamethyldisilazane Dissolved in Supercritical CO<inf>2</inf>
ArticleAbstract: In-situ Fourier transform infrared spectroscopy measurements were obtained by using an innovative eqPalabras claves:HMDS, kinetics, Reaction engineering, Semiconductors, Silylation, Supercritical fluidsAutores:Eduardo Vyhmeister, Estévez L.A., Muscat A.J., Reyes-Bozo L., Roman Nicolay Rodríguez-Maecker, Suleiman D., Valdes-Gonzalez H.Fuentes:scopusStudy of Low-k Film Functionalization and Pore Sealing Using Chlorosilanes Dissolved in Supercritical Carbon Dioxide
ArticleAbstract: Surface functionalization of hydrolyzed methyl-silsesquioxane films were performed by treatment of sPalabras claves:Carbon dioxide, Heterogeneous reaction, Methyltrichlorosilane, Silylation, Supercritical fluid, TrimethylchlorosilaneAutores:Eduardo Vyhmeister, Estévez L.A., Muscat A.J., Reyes-Bozo L., Roman Nicolay Rodríguez-Maecker, Suleiman D.Fuentes:scopus