Single donor induced negative differential resistance in silicon n-type nanowire metal-oxide-semiconductor transistors


Abstract:

This work presents a theoretical study of the influence of a single donor on the transport properties of silicon nanowire transistors. Using a three-dimensional self-consistent nonequilibrium Green's function approach we find that the donor states induce transitions from resonant to antiresonant Breit-Wigner interferences when increasing the gate or drain voltages. Numerical and analytical calculations demonstrate that these interferences strongly degrade the transistor performances but can also generate a remarkable negative differential resistance behavior. The robustness of this phenomenon with respect to a change of the defect position in the channel is an opportunity to develop novel device properties. © 2010 American Institute of Physics.

Año de publicación:

2010

Keywords:

    Fuente:

    scopusscopus

    Tipo de documento:

    Article

    Estado:

    Acceso restringido

    Áreas de conocimiento:

    • Ingeniería electrónica
    • Ingeniería electrónica
    • Nanostructura

    Áreas temáticas de Dewey:

    • Física aplicada
    Procesado con IAProcesado con IA

    Objetivos de Desarrollo Sostenible:

    • ODS 9: Industria, innovación e infraestructura
    • ODS 17: Alianzas para lograr los objetivos
    • ODS 8: Trabajo decente y crecimiento económico
    Procesado con IAProcesado con IA