Single donor induced negative differential resistance in silicon n-type nanowire metal-oxide-semiconductor transistors
Abstract:
This work presents a theoretical study of the influence of a single donor on the transport properties of silicon nanowire transistors. Using a three-dimensional self-consistent nonequilibrium Green's function approach we find that the donor states induce transitions from resonant to antiresonant Breit-Wigner interferences when increasing the gate or drain voltages. Numerical and analytical calculations demonstrate that these interferences strongly degrade the transistor performances but can also generate a remarkable negative differential resistance behavior. The robustness of this phenomenon with respect to a change of the defect position in the channel is an opportunity to develop novel device properties. © 2010 American Institute of Physics.
Año de publicación:
2010
Keywords:
Fuente:

Tipo de documento:
Article
Estado:
Acceso restringido
Áreas de conocimiento:
- Ingeniería electrónica
- Ingeniería electrónica
- Nanostructura
Áreas temáticas de Dewey:
- Física aplicada

Objetivos de Desarrollo Sostenible:
- ODS 9: Industria, innovación e infraestructura
- ODS 17: Alianzas para lograr los objetivos
- ODS 8: Trabajo decente y crecimiento económico
