Single donor induced negative differential resistance in silicon n-type nanowire metal-oxide-semiconductor transistors
Abstract:
This work presents a theoretical study of the influence of a single donor on the transport properties of silicon nanowire transistors. Using a three-dimensional self-consistent nonequilibrium Green's function approach we find that the donor states induce transitions from resonant to antiresonant Breit-Wigner interferences when increasing the gate or drain voltages. Numerical and analytical calculations demonstrate that these interferences strongly degrade the transistor performances but can also generate a remarkable negative differential resistance behavior. The robustness of this phenomenon with respect to a change of the defect position in the channel is an opportunity to develop novel device properties. © 2010 American Institute of Physics.
Año de publicación:
2010
Keywords:
Fuente:
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Tipo de documento:
Article
Estado:
Acceso restringido
Áreas de conocimiento:
- Ingeniería electrónica
- Ingeniería electrónica
- Nanostructura
Áreas temáticas:
- Física aplicada