Original shaped nanowire metal-oxide-semiconductor field-effect transistor with enhanced current characteristics based on three-dimensional modeling
Abstract:
This work presents original nanowire transistor architectures leading to device performance improvement. The influence of channel geometrical patterns on nanowire metal-oxide-semiconductor-field-effect-transistor characteristics is investigated using three-dimensional real-space quantum-mechanical simulations. Our study shows that indented channel improves the on-off current ratio (I on / Ioff) by 32%. This remarkable result is induced by both quasiresonances in the on-regime and more significantly by the presence of a thicker channel potential barrier in the subthreshold domain. We then demonstrate that an optimized indented channel represents a manufacturable opportunity to have a much better control of short channel effects in nanowire transistors. © 2009 American Institute of Physics.
Año de publicación:
2009
Keywords:
Fuente:
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Tipo de documento:
Article
Estado:
Acceso restringido
Áreas de conocimiento:
- Simulación por computadora
- Simulación por computadora
- Simulación por computadora
Áreas temáticas:
- Física aplicada
- Otras ramas de la ingeniería