Original shaped nanowire metal-oxide-semiconductor field-effect transistor with enhanced current characteristics based on three-dimensional modeling


Abstract:

This work presents original nanowire transistor architectures leading to device performance improvement. The influence of channel geometrical patterns on nanowire metal-oxide-semiconductor-field-effect-transistor characteristics is investigated using three-dimensional real-space quantum-mechanical simulations. Our study shows that indented channel improves the on-off current ratio (I on / Ioff) by 32%. This remarkable result is induced by both quasiresonances in the on-regime and more significantly by the presence of a thicker channel potential barrier in the subthreshold domain. We then demonstrate that an optimized indented channel represents a manufacturable opportunity to have a much better control of short channel effects in nanowire transistors. © 2009 American Institute of Physics.

Año de publicación:

2009

Keywords:

    Fuente:

    scopusscopus

    Tipo de documento:

    Article

    Estado:

    Acceso restringido

    Áreas de conocimiento:

    • Simulación por computadora
    • Simulación por computadora
    • Simulación por computadora

    Áreas temáticas:

    • Física aplicada
    • Otras ramas de la ingeniería